1,800 global exhibitors at APLF

16 April 2007




Once more the international leather industry will meet in Hong Kong either as exhibitors or visitors at the APLF from March 28-30, 2007. APLF, Materials, Manufactur-ing and Technology (MMT) 2007 is still the leather industry's largest truly international exhibition with more than 1,800 exhibitors from all over the world. While it may have its competitors, this fair still pulls in a truly global audience both in terms of buyers and sellers. The 30,000 m2 fair at the Hong Kong Convention and Exhibition Centre will feature group pavilions from fifteen countries and regions. There are significant increases in the Hong Kong, Mexican, Ethiopian and Pakistan pavilions. The total space taken by the Hong Kong pavilion has increased by more than 60% compared with last year, while the number of Hong Kong exhibitors has increased by 47%. The Mexican and Ethiopian pavilions have each expanded almost 30%, while the total space allocated to the Pakistani pavilion has increased by 10%. Other pavilions from Argentina, Australia, Brazil, China, France, Germany, India, Italy, Korea, New Zealand, Spain, Taiwan, Türkiye, the UK and the USA give the event its usual international coverage. Specially selected premium samples will be displayed in the Materials Trends' Lounge, a preview of the materials and colour trends for spring/summer 2008. Four major distinctive theme areas will be shown: New Traditions, Magnetism, Pragmatic Well-being and Sphere to Sphere. Many buyers use the Trends' Lounge as a preview of the fair and as an aide for creating a shortlist of stands to visit. This special exhibit is presented in collaboration with Comité Français De La Couleur (French Colour Authority) and Style-Vision. MMT runs concurrently, and in the same venue, as Fashion Access Spring 2007: Asia's largest exhibition for handbags, footwear, travelwear, fur and leather garments and fashion accessories. Prime Source Forum, an event for the global apparel industry, runs concurrently with MMT and Fashion Access.



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